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LEDs gelten als umweltfreundliche Beleuchtungstechnik. Für die Massenanwendung arbeiten die LED-Hersteller an einer Senkung der Kosten bzw. einer Erhöhung der Ausbeute, insbesondere bei der aufwendigen LED-Kristallbeschichtung auf den Wafern. Während der Beschichtung (MOCVD) werden optische In-situ-Messgeräte zur Überwachung des Prozesses genutzt. Die hier vorgestellte Untersuchung beschäftigt sich mit dem Einfluss von Super-Photolumineszenz-Effekten bei einer möglichen In-situ-Prozesskontrolle in der MOCVD.
Gallium Nitride (GaN) and Indium Gallium Nitride (InGaN) have become important semiconductor materials for the LED lighting industry. Recently, a photoluminescence (PL) technique for direct in-situ characterization of GaN and InGaN layers during epitaxial growth in a planetary metalorganic vapor phase epitaxy (MOVPE) reactor was reported. The PL signals reveal – at the earliest possible stage – information about current layer thickness, temperature, composition, surface roughness, and self-absorption. Thus, the PL data is valuable for both controlling and optimizing the growth parameters, thereby promising both better devices and a better yield for the LED industry. This technical report describes an extension of this PL technique to close coupled showerhead (CCS) reactors with narrow optical viewports. In contrast to the wide aperture optics in previous investigations, a compact and all-fiber optical probe without voluminous lens optics, filter elements or beam splitters was used.
In this work we report the first quasi-continuous in-situ photoluminescence study of growing InGaN LED structures inside an industrial-grade metal-organic vapor phase epitaxy (MOVPE) reactor at growth temperature. The photoluminescence spectra contain information about temperature, thickness and composition of the epitaxial layers. Furthermore, the in-situ spectra – even at an early stage of the growth of the active region – can be used to predict the photoluminescence emission wavelength of the structure at room temperature. In this study an accuracy of this predicted wavelength in the range of ± 1.3 nm (2σ) is demonstrated. This technique thus appears suitable for closed-loop control of the emission wavelength of InGaN LEDs already during growth.
Photoluminescence (PL) in GaN or InGaN layers monitored during epitaxial growth at high temperatures permits a quasi-continuous in situ characterization of opto-electronic properties. Therefore, epitaxial parameters can now be optimized at the earliest possible stage. A pulsed and high-power UV laser was required for PL excitation at high temperatures. Herein, the underlying nonlinear mechanism was studied via time-resolved PL experiments and rate equation-based modeling. A temperature-activated and saturable path for quenching over defects was identified. Beyond the saturation threshold, reasonably-intensive PL sets in. At high temperatures not only is the near band gap-PL present, but also—as a new observation—a defect-assisted PL emerges. Apart from these specific electronic transitions in high-temperature PL of GaN, a simple, but reasonably predictive model of the luminescent thin film has been set up to track down interference fringes in the PL spectra. It is worth mentioning that the spectral PL modulation (aiming at the Purcell effect) is often mixed up with ordinary Fabry–Pérot interference. A distinction has become key to properly analyze the spectral signatures of high-temperature PL in order to provide a reliable in situ characterization of GaN layers during epitaxial growth